Reference : Monolithic Integration of Ultrafast Photodetector and MESFET in the GaN Material System
Scientific journals : Article
Engineering, computing & technology : Electrical & electronics engineering
http://hdl.handle.net/10993/5814
Monolithic Integration of Ultrafast Photodetector and MESFET in the GaN Material System
English
Mikulics, M. [> >]
Kordoš, P. [> >]
Gregušová, D. [> >]
Adam, R. [> >]
Kočan, M. [> >]
Wu, S. [> >]
Zhang, J. [> >]
Sobolewski, R. [> >]
Grützmacher, D. [> >]
Marso, Michel mailto [University of Luxembourg > Faculty of Science, Technology and Communication (FSTC) > Engineering Research Unit >]
2011
IEEE Photonics Technology Letters
IEEE
23
17
1189 - 1191
Yes
1041-1135
1941-0174
[en] Gallium nitride (GaN) ; metal–semiconductor–field-effect-transistor (MESFET) ; metal–semiconductor–metal photodetector (MSM PD) ; terahertz (THz)
[en] We have fabricated and characterized ultrafast metal–semiconductor–metal (MSM) photodetectors integrated with metal–semiconductor–field-effect-transistors (MESFETs) integrated in coplanar strip lines in the GaN/AlN/SiC material system. We recorded electrical transients of the single photodetector as short as 0.9 ps wide by optoelectric pump–probe measurements using 360-nm-wavelength and 100-fs-duration laser pulses. Electric photoresponse transients of the photodetector with 6-mV peak amplitude were amplified by the MESFET, resulting in 4-ps-wide and 35-mV peak amplitude signals. This monolithically integrated optoelectronic circuit is presented as a potential candidate for high-speed ultraviolet optoelectronics
http://hdl.handle.net/10993/5814
10.1109/LPT.2011.2157816
1041-1135

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