Atmospheric-Pressure Synthesis of Atomically Smooth, Conformal, and Ultrathin Low‑k Polymer Insulating Layers by Plasma-Initiated and Ultrathin Low‑k Polymer Insulating Layers by Plasma-Initiated

Reference : Atmospheric-Pressure Synthesis of Atomically Smooth, Conformal, and Ultrathin Low‑k P...


	Document type :	Scientific journals : Article
	Discipline(s) :	Physical, chemical, mathematical & earth Sciences : Physics
	To cite this reference:	http://hdl.handle.net/10993/42690

Title :	Atmospheric-Pressure Synthesis of Atomically Smooth, Conformal, and Ultrathin Low‑k Polymer Insulating Layers by Plasma-Initiated and Ultrathin Low‑k Polymer Insulating Layers by Plasma-Initiated
Language :	English
Author, co-author :	Abessolo Ondo, Dominique [Materials Research and Technology Department, Luxembourg Institute of Science and Technology, Luxembourg]
	Loyer, Francois [Materials Research and Technology Department, Luxembourg Institute of Science and Technology, Luxembourg]
	Werner, Florian [University of Luxembourg > Faculty of Science, Technology and Communication (FSTC) > Physics and Materials Science Research Unit >]
	Leturcq, Renaud [Materials Research and Technology Department, Luxembourg Institute of Science and Technology, Luxembourg]
	Dale, Phillip [University of Luxembourg > Faculty of Science, Technology and Communication (FSTC) > Physics and Materials Science Research Unit >]
	Boscher, Nicolas [Materials Research and Technology Department, Luxembourg Institute of Science and Technology]
Publication date :	2020
Journal title :	ACS Applied Polymer Materials
Peer reviewed :	Yes
Audience :	International
Permalink :	http://hdl.handle.net/10993/42690
DOI :	10.1021/acsapm.9b00759

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Open access	2020_Atmospheric-Pressure Synthesis of Atomically Smooth, Conformal etc.pdf		Publisher postprint	7.29 MB	View/Open

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