Transparent conductive CuCrO2 thin films deposited by pulsed injection metal organic chemical vapor deposition: up-scalable process technology for an improved transparency/conductivity trade-off

Reference : Transparent conductive CuCrO2 thin films deposited by pulsed injection metal organic ...


	Document type :	Scientific journals : Article
	Discipline(s) :	Physical, chemical, mathematical & earth Sciences : Physics
	To cite this reference:	http://hdl.handle.net/10993/26865

Title :	Transparent conductive CuCrO2 thin films deposited by pulsed injection metal organic chemical vapor deposition: up-scalable process technology for an improved transparency/conductivity trade-off
Language :	English
Author, co-author :	Crêpellière J. [Luxembourg Institute of Science & Technology - LIST]
	Lunca Popa P. [Luxembourg Institute of Science & Technology - LIST]
	Bahlawane N. [Luxembourg Institute of Science & Technology - LIST]
	Leturcq R. [Luxembourg Institute of Science & Technology - LIST]
	Werner, Florian [University of Luxembourg > Faculty of Science, Technology and Communication (FSTC) > Physics and Materials Science Research Unit >]
	Siebentritt, Susanne [University of Luxembourg > Faculty of Science, Technology and Communication (FSTC) > Physics and Materials Science Research Unit >]
	Lenoble D. [Luxembourg Institute of Science & Technology - LIST]
Publication date :	2016
Journal title :	Journal of Materials Chemistry C
Publisher :	Royal Society of Chemistry
Peer reviewed :	Yes
Audience :	International
ISSN :	2050-7526
e-ISSN :	2050-7534
Permalink :	http://hdl.handle.net/10993/26865
DOI :	10.1039/c6tc00383d

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Open access	2016_Transparent conductive CuCr02thin films deposited by pulsed injection metal organic chemical vapor deposition_etc.pdf		Publisher postprint	2.73 MB	View/Open

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