Formation of laterally displaced porous silicon filters using different fabrication methods

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Paper published in a book (Scientific congresses, symposiums and conference proceedings)

Marso, Michel; Wolter, M.; Arens-Fischer, R. et al.

2000 • In Proceedings of the 3rd International EuroConference on Advanced Semiconductor Devices and Microsystems

Permalink
https://hdl.handle.net/10993/20652

DOI
10.1109/ASDAM.2000.889458

No document available.

Disciplines :

Electrical & electronics engineering

Author, co-author :

Marso, Michel ; Institut für Schicht- und Ionentechnik, Forschungszentrum Jülich GmbH, 52425 Jülich, Germany

Wolter, M.; Institut für Schicht- und Ionentechnik, Forschungszentrum Jülich GmbH, 52425 Jülich, Germany

Arens-Fischer, R.; Institut für Schicht- und Ionentechnik, Forschungszentrum Jülich GmbH, 52425 Jülich, Germany

Kordos, P.; Institut für Schicht- und Ionentechnik, Forschungszentrum Jülich GmbH, 52425 Jülich, Germany

Lüth, H.; Institut für Schicht- und Ionentechnik, Forschungszentrum Jülich GmbH, 52425 Jülich, Germany

External co-authors :

yes

Language :

English

Title :

Formation of laterally displaced porous silicon filters using different fabrication methods

Publication date :

2000

Event name :

3rd International EuroConference on Advanced Semiconductor Devices and Microsystems

Event date :

2000

Main work title :

Proceedings of the 3rd International EuroConference on Advanced Semiconductor Devices and Microsystems

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