Reference : Formation of laterally displaced porous silicon filters using different fabrication m...
Scientific congresses, symposiums and conference proceedings : Paper published in a book
Engineering, computing & technology : Electrical & electronics engineering
http://hdl.handle.net/10993/20652
Formation of laterally displaced porous silicon filters using different fabrication methods
English
Marso, Michel mailto [Institut für Schicht- und Ionentechnik, Forschungszentrum Jülich GmbH, 52425 Jülich, Germany]
Wolter, M. [Institut für Schicht- und Ionentechnik, Forschungszentrum Jülich GmbH, 52425 Jülich, Germany]
Arens-Fischer, R. [Institut für Schicht- und Ionentechnik, Forschungszentrum Jülich GmbH, 52425 Jülich, Germany]
Kordos, P. [Institut für Schicht- und Ionentechnik, Forschungszentrum Jülich GmbH, 52425 Jülich, Germany]
Lüth, H. [Institut für Schicht- und Ionentechnik, Forschungszentrum Jülich GmbH, 52425 Jülich, Germany]
2000
Proceedings of the 3rd International EuroConference on Advanced Semiconductor Devices and Microsystems
No
3rd International EuroConference on Advanced Semiconductor Devices and Microsystems
2000
http://hdl.handle.net/10993/20652

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