Formation of laterally displaced porous silicon filters using different fabrication methods

Reference : Formation of laterally displaced porous silicon filters using different fabrication m...


	Document type :	Scientific congresses, symposiums and conference proceedings : Paper published in a book
	Discipline(s) :	Engineering, computing & technology : Electrical & electronics engineering
	To cite this reference:	http://hdl.handle.net/10993/20652

Title :	Formation of laterally displaced porous silicon filters using different fabrication methods
Language :	English
Author, co-author :	Marso, Michel [Institut für Schicht- und Ionentechnik, Forschungszentrum Jülich GmbH, 52425 Jülich, Germany]
	Wolter, M. [Institut für Schicht- und Ionentechnik, Forschungszentrum Jülich GmbH, 52425 Jülich, Germany]
	Arens-Fischer, R. [Institut für Schicht- und Ionentechnik, Forschungszentrum Jülich GmbH, 52425 Jülich, Germany]
	Kordos, P. [Institut für Schicht- und Ionentechnik, Forschungszentrum Jülich GmbH, 52425 Jülich, Germany]
	Lüth, H. [Institut für Schicht- und Ionentechnik, Forschungszentrum Jülich GmbH, 52425 Jülich, Germany]
Publication date :	2000
Main document title :	Proceedings of the 3rd International EuroConference on Advanced Semiconductor Devices and Microsystems
Peer reviewed :	No
Event name :	3rd International EuroConference on Advanced Semiconductor Devices and Microsystems
Event date :	2000
Permalink :	http://hdl.handle.net/10993/20652

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