Reference : Formation of laterally displaced porous silicon filters using different fabrication m... |
Scientific congresses, symposiums and conference proceedings : Paper published in a book | |||
Engineering, computing & technology : Electrical & electronics engineering | |||
http://hdl.handle.net/10993/20652 | |||
Formation of laterally displaced porous silicon filters using different fabrication methods | |
English | |
Marso, Michel ![]() | |
Wolter, M. [Institut für Schicht- und Ionentechnik, Forschungszentrum Jülich GmbH, 52425 Jülich, Germany] | |
Arens-Fischer, R. [Institut für Schicht- und Ionentechnik, Forschungszentrum Jülich GmbH, 52425 Jülich, Germany] | |
Kordos, P. [Institut für Schicht- und Ionentechnik, Forschungszentrum Jülich GmbH, 52425 Jülich, Germany] | |
Lüth, H. [Institut für Schicht- und Ionentechnik, Forschungszentrum Jülich GmbH, 52425 Jülich, Germany] | |
2000 | |
Proceedings of the 3rd International EuroConference on Advanced Semiconductor Devices and Microsystems | |
No | |
3rd International EuroConference on Advanced Semiconductor Devices and Microsystems | |
2000 | |
http://hdl.handle.net/10993/20652 |
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