Article (Scientific journals)
Integrated photometer with porous silicon interference filters
Hunkel, D.; Marso, Michel; Butz, R. et al.
2000In Materials Science and Engineering: A: Structural Materials: Properties, Microstructures and Processing, B69-70 ((2000)), p. 100-103
Peer reviewed
 

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Keywords :
Porous silicon; Lateral gradient; Photometer; Fabry-Perot
Abstract :
[en] Porous silicon transmission interference filters with laterally varying transmission wavelengths are used to manufacture a photometer. Because of the linear varying transmission characteristic of the filter it is possible to measure, beyond small regions of the porous layer, the correlated spectral photo current. It is therefore necessary to bring up a series of ohmic metal contacts along the porous filter. Between two neighbouring contacts one can measure the spectral photo current of the transmission wavelength at this specific point of the surface. By measuring multiple pairs of contacts, the whole spectrum between 400 and 1100 nm wavelength can be recorded. First results of the resolution capability and sensitivity are demonstrated.
Disciplines :
Electrical & electronics engineering
Identifiers :
UNILU:UL-ARTICLE-2009-341
Author, co-author :
Hunkel, D.;  Institute of Thin Film and Ion Technology (ISI), Research Center Ju¨lich, D-52425 Ju¨lich, Germany
Marso, Michel ;  Institute of Thin Film and Ion Technology (ISI), Research Center Ju¨lich, D-52425 Ju¨lich, Germany
Butz, R.;  Institute of Thin Film and Ion Technology (ISI), Research Center Ju¨lich, D-52425 Ju¨lich, Germany
Arens-Fischer, R.;  Institute of Thin Film and Ion Technology (ISI), Research Center Ju¨lich, D-52425 Ju¨lich, Germany
Lüth, H.;  Institute of Thin Film and Ion Technology (ISI), Research Center Ju¨lich, D-52425 Ju¨lich, Germany
External co-authors :
yes
Language :
English
Title :
Integrated photometer with porous silicon interference filters
Publication date :
2000
Journal title :
Materials Science and Engineering: A: Structural Materials: Properties, Microstructures and Processing
ISSN :
0921-5093
Publisher :
Elsevier Science
Volume :
B69-70
Issue :
(2000)
Pages :
100-103
Peer reviewed :
Peer reviewed
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