Article (Scientific journals)
Threshold for potential sputtering of LiF
Hayderer, G.; Schmid, M.; Varga, P. et al.
1999In Physical Review Letters, 83 (19), p. 3948-3951
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Abstract :
[en] We have measured total sputtering yields for impact of slow (less than or equal to 100 eV) singly and doubly charged ions on LiF. The minimum potential energy necessary to induce potential sputtering (PS) from UF was determined to be about 10 eV. This threshold coincides with the energy necessary to produce a cold hole in the valence band of LiF by resonant neutralization. This allows the first unambiguous identification of PS induced by cold holes. Further stepwise increase of the sputtering yield with higher projectile potential energies provides evidence for additional defect-mediated sputtering mechanisms operative in alkali halides.
Disciplines :
Physics
Author, co-author :
Hayderer, G.;  Technische Universität Wien = Vienna University of Technology - TU Vienna > Institut für Allgemeine Physik
Schmid, M.;  Technische Universität Wien = Vienna University of Technology - TU Vienna > Institut für Allgemeine Physik
Varga, P.;  Technische Universität Wien = Vienna University of Technology - TU Vienna > Institut für Allgemeine Physik
Winter, H. P.;  Technische Universität Wien = Vienna University of Technology - TU Vienna > Institut für Allgemeine Physik
Aumayr, F.;  Technische Universität Wien = Vienna University of Technology - TU Vienna > Institut für Allgemeine Physik
Wirtz, Ludger ;  Technische Universität Wien = Vienna University of Technology - TU Vienna > Institute for Theoretical Physics
Lemell, C.;  Technische Universität Wien = Vienna University of Technology - TU Vienna > Institute for Theoretical Physics
Burgdorfer, J.;  Technische Universität Wien = Vienna University of Technology - TU Vienna > Institute for Theoretical Physics
Hagg, L.;  Mid Sweden University > Department of Physics and Mathematics
Reinhold, C. O.;  Oak Ridge National Laboratory, Oak Ridge, Tennessee
Language :
English
Title :
Threshold for potential sputtering of LiF
Publication date :
1999
Journal title :
Physical Review Letters
ISSN :
1079-7114
Publisher :
American Physical Society, Ridge, United States - New York
Volume :
83
Issue :
19
Pages :
3948-3951
Peer reviewed :
Peer Reviewed verified by ORBi
Available on ORBilu :
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