Reference : Kinetically assisted potential sputtering of insulators by highly charged ions
Scientific journals : Article
Physical, chemical, mathematical & earth Sciences : Physics
http://hdl.handle.net/10993/17404
Kinetically assisted potential sputtering of insulators by highly charged ions
English
Hayderer, G. [Technische Universität Wien = Vienna University of Technology - TU Vienna > Institut für Allgemeine Physik]
Cernusca, S. [Technische Universität Wien = Vienna University of Technology - TU Vienna > Institut für Allgemeine Physik]
Schmid, M. [Technische Universität Wien = Vienna University of Technology - TU Vienna > Institut für Allgemeine Physik]
Varga, P. [Technische Universität Wien = Vienna University of Technology - TU Vienna > Institut für Allgemeine Physik]
Winter, H. P. [Technische Universität Wien = Vienna University of Technology - TU Vienna > Institut für Allgemeine Physik]
Aumayr, F. [Technische Universität Wien = Vienna University of Technology - TU Vienna > Institut für Allgemeine Physik]
Niemann, D. [Hahn Meitner Institut, Berlin]
Hoffmann, V. [Hahn Meitner Institut, Berlin]
Stolterfoht, N. [Hahn Meitner Institut, Berlin]
Lemell, C. [Technische Universität Wien = Vienna University of Technology - TU Vienna > Institute for Theoretical Physics]
Wirtz, Ludger mailto [Technische Universität Wien = Vienna University of Technology - TU Vienna > Institute for Theoretical Physics]
Burgdorfer, J. [Technische Universität Wien = Vienna University of Technology - TU Vienna > Institute for Theoretical Physics]
2001
Physical Review Letters
American Physical Society
86
16
3530-3533
Yes (verified by ORBilu)
International
0031-9007
1079-7114
Ridge
NY
[en] A new form of potential sputtering has been found for impact of slow (less than or equal to 1500 eV) multiply charged Xe ions (charge states up to q = 25) on MgOx. In contrast to alkali-halide or SiO2 surfaces this mechanism requires the simultaneous presence of electronic excitation of the target material and of a kinetically formed collision cascade within the target in order to initiate the sputtering process. This kinetically assisted potential sputtering mechanism has been identified to be present for ether insulating surfaces as well.
http://hdl.handle.net/10993/17404
10.1103/PhysRevLett.86.3530

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