[en] A new form of potential sputtering has been found for impact of slow (less than or equal to 1500 eV) multiply charged Xe ions (charge states up to q = 25) on MgOx. In contrast to alkali-halide or SiO2 surfaces this mechanism requires the simultaneous presence of electronic excitation of the target material and of a kinetically formed collision cascade within the target in order to initiate the sputtering process. This kinetically assisted potential sputtering mechanism has been identified to be present for ether insulating surfaces as well.
Disciplines :
Physique
Auteur, co-auteur :
Hayderer, G.; Technische Universität Wien = Vienna University of Technology - TU Vienna > Institut für Allgemeine Physik
Cernusca, S.; Technische Universität Wien = Vienna University of Technology - TU Vienna > Institut für Allgemeine Physik
Schmid, M.; Technische Universität Wien = Vienna University of Technology - TU Vienna > Institut für Allgemeine Physik
Varga, P.; Technische Universität Wien = Vienna University of Technology - TU Vienna > Institut für Allgemeine Physik
Winter, H. P.; Technische Universität Wien = Vienna University of Technology - TU Vienna > Institut für Allgemeine Physik
Aumayr, F.; Technische Universität Wien = Vienna University of Technology - TU Vienna > Institut für Allgemeine Physik
Niemann, D.; Hahn Meitner Institut, Berlin
Hoffmann, V.; Hahn Meitner Institut, Berlin
Stolterfoht, N.; Hahn Meitner Institut, Berlin
Lemell, C.; Technische Universität Wien = Vienna University of Technology - TU Vienna > Institute for Theoretical Physics
WIRTZ, Ludger ; Technische Universität Wien = Vienna University of Technology - TU Vienna > Institute for Theoretical Physics
Burgdorfer, J.; Technische Universität Wien = Vienna University of Technology - TU Vienna > Institute for Theoretical Physics
Langue du document :
Anglais
Titre :
Kinetically assisted potential sputtering of insulators by highly charged ions
Date de publication/diffusion :
2001
Titre du périodique :
Physical Review Letters
ISSN :
0031-9007
eISSN :
1079-7114
Maison d'édition :
American Physical Society, Ridge, Etats-Unis - New York
