Kinetically assisted potential sputtering of insulators by highly charged ions

Hayderer, G.; Cernusca, S.; Schmid, M.; Varga, P.; Winter, H. P.; Aumayr, F.; Niemann, D.; Hoffmann, V.; Stolterfoht, N.; Lemell, C.; Wirtz, Ludger; Burgdorfer, J.

doi:10.1103/PhysRevLett.86.3530

Reference : Kinetically assisted potential sputtering of insulators by highly charged ions


	Document type :	Scientific journals : Article
	Discipline(s) :	Physical, chemical, mathematical & earth Sciences : Physics
	To cite this reference:	http://hdl.handle.net/10993/17404

Title :	Kinetically assisted potential sputtering of insulators by highly charged ions
Language :	English
Author, co-author :	Hayderer, G. [Technische Universität Wien = Vienna University of Technology - TU Vienna > Institut für Allgemeine Physik]
	Cernusca, S. [Technische Universität Wien = Vienna University of Technology - TU Vienna > Institut für Allgemeine Physik]
	Schmid, M. [Technische Universität Wien = Vienna University of Technology - TU Vienna > Institut für Allgemeine Physik]
	Varga, P. [Technische Universität Wien = Vienna University of Technology - TU Vienna > Institut für Allgemeine Physik]
	Winter, H. P. [Technische Universität Wien = Vienna University of Technology - TU Vienna > Institut für Allgemeine Physik]
	Aumayr, F. [Technische Universität Wien = Vienna University of Technology - TU Vienna > Institut für Allgemeine Physik]
	Niemann, D. [Hahn Meitner Institut, Berlin]
	Hoffmann, V. [Hahn Meitner Institut, Berlin]
	Stolterfoht, N. [Hahn Meitner Institut, Berlin]
	Lemell, C. [Technische Universität Wien = Vienna University of Technology - TU Vienna > Institute for Theoretical Physics]
	Wirtz, Ludger [Technische Universität Wien = Vienna University of Technology - TU Vienna > Institute for Theoretical Physics]
	Burgdorfer, J. [Technische Universität Wien = Vienna University of Technology - TU Vienna > Institute for Theoretical Physics]
Publication date :	2001
Journal title :	Physical Review Letters
Publisher :	American Physical Society
Volume :	86
Issue/season :	16
Pages :	3530-3533
Peer reviewed :	Yes (verified by ORBi^lu)
Audience :	International
ISSN :	0031-9007
e-ISSN :	1079-7114
City :	Ridge
Country :	NY
Abstract :	[en] A new form of potential sputtering has been found for impact of slow (less than or equal to 1500 eV) multiply charged Xe ions (charge states up to q = 25) on MgOx. In contrast to alkali-halide or SiO2 surfaces this mechanism requires the simultaneous presence of electronic excitation of the target material and of a kinetically formed collision cascade within the target in order to initiate the sputtering process. This kinetically assisted potential sputtering mechanism has been identified to be present for ether insulating surfaces as well.
Permalink :	http://hdl.handle.net/10993/17404
DOI :	10.1103/PhysRevLett.86.3530

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