Reference : Post-deposition annealing and interfacial atomic layer deposition buffer layers of Sb...
Scientific journals : Article
Physical, chemical, mathematical & earth Sciences : Physics
http://hdl.handle.net/10993/53859
Post-deposition annealing and interfacial atomic layer deposition buffer layers of Sb2Se3/CdS stacks for reduced interface recombination and increased open-circuit voltages
English
Weiss, Thomas mailto [University of Luxembourg > Faculty of Science, Technology and Medicine (FSTM) > Department of Physics and Materials Science (DPHYMS) >]
Minguez-Bacho, Minguez-Bacho [Chemistry of Thin Film Materials, IZNF, Friedrich-Alexander University of Erlangen- Nurnberg, Erlangen, Germany]
Zuccala, Elena mailto [University of Luxembourg > Faculty of Science, Technology and Medicine (FSTM) > Department of Physics and Materials Science (DPHYMS) >]
Melchiorre, Michele mailto [University of Luxembourg > Faculty of Science, Technology and Medicine (FSTM) > Department of Physics and Materials Science (DPHYMS) >]
Valle, Nathalie [Materials Research and Technology Department, Luxembourg Institute of Science and Technology, Belvaux, Luxembourg]
El Adib, Brahime [Materials Research and Technology Department, Luxembourg Institute of Science and Technology, Belvaux, Luxembourg]
Yokosawa, Tadahiro [Institute of Micro- and Nanostructure Research (IMN) & Center for Nanoanalysis and Electron Microscopy (CENEM), IZNF, Friedrich-Alexander University Erlangen- Nürnberg,]
Spiecker [Institute of Micro- and Nanostructure Research (IMN) & Center for Nanoanalysis and Electron Microscopy (CENEM), IZNF, Friedrich-Alexander University Erlangen- Nürnberg,]
Bachmann, Julien [4Chemistry of Thin Film Materials, IZNF, Friedrich-Alexander University of Erlangen- Nurnberg]
Dale, Phillip mailto [University of Luxembourg > Faculty of Science, Technology and Medicine (FSTM) > Department of Physics and Materials Science (DPHYMS) >]
Siebentritt, Susanne mailto [University of Luxembourg > Faculty of Science, Technology and Medicine (FSTM) > Department of Physics and Materials Science (DPHYMS) >]
2022
Progress in Photovoltaics
John Wiley & Sons
Yes
International
1062-7995
1099-159X
Hoboken
United States - New Jersey
http://hdl.handle.net/10993/53859
10.1002/pip.3625

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