4-Amino-1,2,4-triazole: Playing a key role in the chemical deposition of Cu–In–Ga metal layers for photovoltaic applications.

Berner, Ulrich; Widenmeyer, Markus; Engler, Patrick; DALE, Phillip

doi:10.1016/J.TSF.2014.10.057

Article (Scientific journals)

4-Amino-1,2,4-triazole: Playing a key role in the chemical deposition of Cu–In–Ga metal layers for photovoltaic applications.

Berner, Ulrich; Widenmeyer, Markus; Engler, Patrick et al.

2014 • In Thin Solid Films

Peer reviewed

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https://hdl.handle.net/10993/19130

DOI
10.1016/J.TSF.2014.10.057

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Disciplines :

Physics

Author, co-author :

Berner, Ulrich; Robert Bosch GmbH, Germany

Widenmeyer, Markus; Robert Bosch GmbH, Germany

Engler, Patrick; Robert Bosch GmbH, Germany

DALE, Phillip ; University of Luxembourg > Faculty of Science, Technology and Communication (FSTC) > Physics and Materials Science Research Unit

Language :

English

Title :

4-Amino-1,2,4-triazole: Playing a key role in the chemical deposition of Cu–In–Ga metal layers for photovoltaic applications.

Publication date :

2014

Journal title :

Thin Solid Films

Peer reviewed :

Peer reviewed

Available on ORBilu :

since 17 December 2014

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