4-Amino-1,2,4-triazole: Playing a key role in the chemical deposition of Cu–In–Ga metal layers for photovoltaic applications.

Reference : 4-Amino-1,2,4-triazole: Playing a key role in the chemical deposition of Cu–In–Ga met...


	Document type :	Scientific journals : Article
	Discipline(s) :	Physical, chemical, mathematical & earth Sciences : Physics
	To cite this reference:	http://hdl.handle.net/10993/19130

Title :	4-Amino-1,2,4-triazole: Playing a key role in the chemical deposition of Cu–In–Ga metal layers for photovoltaic applications.
Language :	English
Author, co-author :	Berner, Ulrich [Robert Bosch GmbH, Germany]
	Widenmeyer, Markus [Robert Bosch GmbH, Germany]
	Engler, Patrick [Robert Bosch GmbH, Germany]
	Dale, Phillip [University of Luxembourg > Faculty of Science, Technology and Communication (FSTC) > Physics and Materials Science Research Unit >]
Publication date :	2014
Journal title :	Thin Solid Films
Peer reviewed :	Yes
Audience :	International
Permalink :	http://hdl.handle.net/10993/19130
DOI :	10.1016/J.TSF.2014.10.057

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