References of "Physical Review Letters"
     in
Bookmark and Share    
Full Text
Peer Reviewed
See detailComment on magnetic correlations in nanostructured ferromagnets
Weissmüller, J.; Michels, Andreas UL

in Physical Review Letters (2001), 87(14), 149701-149701

A Comment on the Letter by Jörg F. Löffler, Hans Benjamin Braun, and Werner Wagner, Phys. Rev. Lett. 85, 1990 (2000). The authors of the Letter offer a Reply.

Detailed reference viewed: 166 (0 UL)
Full Text
Peer Reviewed
See detailKinetically assisted potential sputtering of insulators by highly charged ions
Hayderer, G.; Cernusca, S.; Schmid, M. et al

in Physical Review Letters (2001), 86(16), 3530-3533

A new form of potential sputtering has been found for impact of slow (less than or equal to 1500 eV) multiply charged Xe ions (charge states up to q = 25) on MgOx. In contrast to alkali-halide or SiO2 ... [more ▼]

A new form of potential sputtering has been found for impact of slow (less than or equal to 1500 eV) multiply charged Xe ions (charge states up to q = 25) on MgOx. In contrast to alkali-halide or SiO2 surfaces this mechanism requires the simultaneous presence of electronic excitation of the target material and of a kinetically formed collision cascade within the target in order to initiate the sputtering process. This kinetically assisted potential sputtering mechanism has been identified to be present for ether insulating surfaces as well. [less ▲]

Detailed reference viewed: 89 (0 UL)
Full Text
Peer Reviewed
See detailThreshold for potential sputtering of LiF
Hayderer, G.; Schmid, M.; Varga, P. et al

in Physical Review Letters (1999), 83(19), 3948-3951

We have measured total sputtering yields for impact of slow (less than or equal to 100 eV) singly and doubly charged ions on LiF. The minimum potential energy necessary to induce potential sputtering (PS ... [more ▼]

We have measured total sputtering yields for impact of slow (less than or equal to 100 eV) singly and doubly charged ions on LiF. The minimum potential energy necessary to induce potential sputtering (PS) from UF was determined to be about 10 eV. This threshold coincides with the energy necessary to produce a cold hole in the valence band of LiF by resonant neutralization. This allows the first unambiguous identification of PS induced by cold holes. Further stepwise increase of the sputtering yield with higher projectile potential energies provides evidence for additional defect-mediated sputtering mechanisms operative in alkali halides. [less ▲]

Detailed reference viewed: 78 (0 UL)