References of "Horstmann, M."
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See detailOptoelectronic D.C. and R.F. behavior of InP/InGaAs Based HEMTs
Marso, Michel UL; Horstmann, M.; Hardtdegen, H. et al

in Solid-State Electronics (1998), 42(1998), 197-200

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See detailHigh Bandwidth InP/InGaAs Based MSM-2DEG Diodes For Optoelectronic Application,
Marso, Michel UL; Horstmann, M.; Schimpf, K. et al

in Proceedings of the 9th International Conference on InP and Related Materials (1997)

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See detailMSM Photodetectors Based on InP/InGaAs 2DEG Structures, in Optoelectronic Properties of Semiconductors and Superlattices
Horstmann, M.; Marso, Michel UL; Kordoš, P.

Book published by Gordon and Brerach Science Publishers (1997)

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See detailElectrical Behaviour of the InP/InGaAs Based MSM-2DEG Diode
Marso, Michel UL; Horstmann, M.; Hardtdegen, H. et al

in Solid-State Electronics (1997), 41(1997), 25-31

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See detailDemonstration of Nitrogen Carrier Gas in MOVPE For InP/InGaAs-Based High Frequency and Optoelectronic Integrated Devices
Hardtdegen, H.; Marso, Michel UL; Horstmann, M. et al

in Proceedings of the 9th International Conference on InP and Related Materials, Hyannis, Massachusetts, USA (1997)

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See detail0.1 µm T-gate Al-free InP/InGaAs/InP pHEMTs for W-Band Applications Using a Nitrogen Carrier for LP-MOCVD Growth
Schimpf, K.; Sommer, M.; Horstmann, M. et al

in IEEE Electron Device Letters (1997), 18

We report on the dc and RF performance of HEMT’s based on the Al-free material system InP/InGaAs/InP. These structures were grown by LP-MOCVD using a nitrogen carrier. The influence of gate length and ... [more ▼]

We report on the dc and RF performance of HEMT’s based on the Al-free material system InP/InGaAs/InP. These structures were grown by LP-MOCVD using a nitrogen carrier. The influence of gate length and channel composition on the performance of these devices is investigated.We demonstrate that optimum dc and RF performance using highly strained channels can be obtained only if additional composite channels are grown. The cutoff frequencies fT =160 GHz and fmax=260 GHz for a 0.1- um T-gate device indicate the suitability of our devices for W-Band applications. [less ▲]

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See detailThermionic Field Emission in p-Barrier enhanced InP/InGaAs/InP HEMTs
Schimpf, K.; Horstmann, M.; Hardtdegen, H. et al

in Electronics Letters (1996), 32(1996), 2132-2133

A model for thermionic field emission in p-barrier enhanced InP HEMTs is presented indicating that a reduction in the gate leakage of those devices is related to an increase in effective barrier thickness ... [more ▼]

A model for thermionic field emission in p-barrier enhanced InP HEMTs is presented indicating that a reduction in the gate leakage of those devices is related to an increase in effective barrier thickness. Good agreement between this model and our experimental data is obtained. [less ▲]

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See detailSimple Realization of a Monolithic Integrated Photoreceiver for 10GBit/s Using an InP/InGaAs Heterostructure
Horstmann, M.; Hollfelder, M.; Schimpf, K. et al

in Proceedings of the 8th International Conference on InP and Related Compounds, Schwäbisch Gmünd, Germany (1996)

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See detailInP-Based Monolithically Integrated Photoreceiver for 4-10Gbit/s Optoelectronic Systems
Horstmann, M.; Hardtdegen, H.; Schimpf, K. et al

in Proceedings of the Gallium Arsenide Application Symposium GAAS 96, Paris, France (1996)

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See detailFrequency Response of InP/InGaAs MSM Photodetector with Current Transport Along 2DEG
Horstmann, M.; Hollfelder, M.; Muttersbach, J. et al

in Proceedings of the 8th International Conference on InP and Related Compounds, Schwäbisch Gmünd, Germany (1996)

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See detailMonolithic Integrated Photoreceiver for 10GBit/s Systems Prepared on InGaAs/InP 2DEG Structure,
Horstmann, M.; Schimpf, K.; Marso, Michel UL et al

in Proceedings of the International Conference on Telecommunications Istanbul, Turkye (1996)

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See detail0.2µm T-gate InP/InGaAs/InP pHEMT with InGaP Diffusion Barrier Layer Grown by LP-MOCVD using an N2-Carrier
Schimpf, K.; Hollfelder, M.; Horstmann, M. et al

in Proceedings of the 8th International Conference on InP and Related Compounds, Schwäbisch Gmünd, Germany (1996)

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See detailNovel MSM-2DEG PD/HEMT Photoreceiver for 10 Gbit/s Operation
Horstmann, M.; Muttersbach, J.; v.d.Hart, A. et al

in Proceedings of the 26th European Solid State Devices Research Conference, Bologna, Italy (1996)

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See detailResponsivity Enhancement of InGaAs Based MSM Photodetectors Using 2DEG Layer Sequence and Semitransparent Electrodes
Horstmann, M.; Marso, Michel UL; Muttersbach, J. et al

in Electronics Letters (1996), 32

The optoelectronic behaviour of InGaAs based metalsemiconductor-metal photodetectors with semitransparent electrodes is investigated. The devices with 50 x 50 um2 area and interdigitated electrodes with ... [more ▼]

The optoelectronic behaviour of InGaAs based metalsemiconductor-metal photodetectors with semitransparent electrodes is investigated. The devices with 50 x 50 um2 area and interdigitated electrodes with 2um finger-spacing and finger-width exhibit a dark current density less than 10pA/um2, a breakdown voltage of 45V and a saturation capacitance of 30fF. A DC responsivity of 0.61A/W and a –3dB bandwidth of 8.5GHz were achieved. The electric potential distribution is modified by a 2DEG inserted in the layer structure leading, to improved bandwidth. [less ▲]

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See detailInP/GaInAs MSM Photodetector for Simple Integration in HEMT Circuits
Horstmann, M.; Marso, Michel UL; Schimpf, K. et al

Book published by Kluver Academic Publishers (1996)

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See detail0.2µm T-gate InP/InGaAs/InP pHEMT with an InGaP Diffusion Barrier Layer Grown By LP-MOCVD Using an N2-carrier
Schimpf, K.; Hollfelder, M.; Horstmann, M. et al

in Proceedings of the 26th European Solid State Devices Research Conference, Bologna, Italy, 1996 (1996)

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See detail16 GHz Bandwidth MSM Photodetector and 45/85 GHz fT/fmax HEMT Prepared on an Identical InGaAs/InP Layer Structure
Horstmann, M.; Schimpf, K.; Marso, Michel UL et al

in Electronics Letters (1996), 32

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See detailNovel InP/GaInAs Photodetector for Integration in HEMT Circuits
Horstmann, M.; Marso, Michel UL; Schimpf, K. et al

in Proceedings of the 25th European Solid State Devices Research Conference, Den Haag, The Netherlands (1995)

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See detailInP/InGaAs Photodetector Based on a High Electron Mobility Transistor Layer Structure: Its Response at 1.3 µm wavelength
Horstmann, M.; Marso, Michel UL; Fox, A. et al

in Applied Physics Letters (1995), 67(1995), 106-108

We report on the investigation of the room-temperature optoelectronic behavior of a metal–semiconductor–metal two-dimensional electron gas photodiode based on the two-dimensional electron gas of a high ... [more ▼]

We report on the investigation of the room-temperature optoelectronic behavior of a metal–semiconductor–metal two-dimensional electron gas photodiode based on the two-dimensional electron gas of a high electron mobility transistor structure. The photodetector is fabricated in the InP/InGaAs material system, without use of Al-containing layers. Optoelectronic measurements on a device with a finger spacing of 3 mm show a full width at half-maximum (FWHM) of the pulse response of <60 ps, which is the resolution limit of our measurement equipment. Low-temperature measurements at 40 K with electro-optical sampling at a wavelength of 890 nm show a FWHM of 1 ps. [less ▲]

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See detailA Novel InP/InGaAs Photodetector Based on a 2DEG layer structure
Marso, Michel UL; Horstmann, M.; Rüders, F. et al

in Proceedings of the 6th International Conference on InP and Related Compounds, Santa Barbara, California USA (1994)

Detailed reference viewed: 81 (0 UL)