![]() ; ; et al in Solid-State Electronics (1999), 43(1999), 529-535 A novel vertical MOSFET concept using selective epitaxial growth by low pressure chemical vapor deposition is proposed and the ®rst p-channel device characteristics measured are described. In contrast to ... [more ▼] A novel vertical MOSFET concept using selective epitaxial growth by low pressure chemical vapor deposition is proposed and the ®rst p-channel device characteristics measured are described. In contrast to other MOS technologies, the gate oxide is deposited before epitaxy, and therefore it exists before the channel region is grown. Compared to planar layouts, the vertical layout increases the packing density without the use of advanced lithography; the extent of the increase depends on application. Compared to other vertical transistors, this concept reduces overlap capacitance and o ers the possibility of three-dimensional integration. Vertical p channel MOSFETs with a channel length LG down to 130 nm and a gate oxide thickness dox down to 12 nm have been fabricated and yield a transconductance of 100 mS mm-1. [less ▲] Detailed reference viewed: 92 (0 UL)![]() ; ; et al in Electrochimica Acta (1999), 44(1999), 3821-3826 A bioelectronic interface based on the coupling of an intact insect antenna to a field-e effct transistor (FET) has been realised in a whole-beetle BioFET (Biologically sensitive FET) and an isolated ... [more ▼] A bioelectronic interface based on the coupling of an intact insect antenna to a field-e effct transistor (FET) has been realised in a whole-beetle BioFET (Biologically sensitive FET) and an isolated-antenna BioFET configuration. The intrinsic BioFET characteristics, such as current-voltage curves, transconductance and signal-to-noise ratio clearly depend on the chip layout. Therefore, the experiments were performed with three di erent gate geometries: linear shape (5 um x 100 um), U shape (5 um x 1000 um) and meander shape (10 um x 6000 um). The BioFET allows the determination of the `green-leaf odour' Z-3-hexen-l-ol down to the low ppb concentration range. Thus, the detection of plant damages is possible with this novel kind of biosensor. [less ▲] Detailed reference viewed: 99 (0 UL)![]() Marso, Michel ![]() in IEEE Photonics Technology Letters (1999), 11 The optoelectronic dc and RF behavior of an InAlAs–InGaAs optically controlled field-effect transistor based on a high electron mobility transistor layer structure is investigated at 1.3- um wavelength ... [more ▼] The optoelectronic dc and RF behavior of an InAlAs–InGaAs optically controlled field-effect transistor based on a high electron mobility transistor layer structure is investigated at 1.3- um wavelength light. The device is backside-illuminated to increase the responsivity. A transistor with 0.3-u m gate length and an active area of 50 x 50 u m2 exhibits a responsivity of 235 A/W, at 11- W incident optical power. The photoconductive response is higher than for an metal–semiconductor–metal photodetector with the same InGaAs absorption layer thickness up to 10 GHz. [less ▲] Detailed reference viewed: 50 (0 UL)![]() ; ; et al in Electronics Letters (1999), 35(1999), 239-240 Vertical Si p-MOSFETs with channel lengths of 100nm were fabricated using selective low pressure chemical vapour deposition (LPCVD) epitaxial growth and conventional i-line lithography. The layout, called ... [more ▼] Vertical Si p-MOSFETs with channel lengths of 100nm were fabricated using selective low pressure chemical vapour deposition (LPCVD) epitaxial growth and conventional i-line lithography. The layout, called VOXFET, reduces gate to source/drain overlap capacitances, thus improving high speed applications. Transistors with a gate width of 12 um and gate oxide thickness of 10nm show transconductances gM of 200mS/mm and measured cutoff frequencies of fT = 8.7GHz and fMAX = 19.2 GHz. [less ▲] Detailed reference viewed: 149 (0 UL)![]() ; ; Marso, Michel ![]() in Electronics Letters (1998), 34(1998), 119-120 The authors demonstrate that a 550GHz bandwidth photodetector can be fabricated on low-temperature grown MBE GaAs. The pulse response shows 0.4 and 0.6ps rise and fall times, respectively. The bandwidth ... [more ▼] The authors demonstrate that a 550GHz bandwidth photodetector can be fabricated on low-temperature grown MBE GaAs. The pulse response shows 0.4 and 0.6ps rise and fall times, respectively. The bandwidth is in agreement with a value calculated using a carrier lifetime of 0.2ps, measured by femtosecond time-resolved reflectivity, and a capacitance of 0.014fF/um2, determined from microwave measurements. The device bandwidth is RC limited. [less ▲] Detailed reference viewed: 95 (0 UL)![]() ; ; et al in Proceedings of the 28th European Solid State Devices Research Conference, Bordeaux, France (1998) Detailed reference viewed: 29 (0 UL)![]() Marso, Michel ![]() in Solid-State Electronics (1998), 42(1998), 197-200 Detailed reference viewed: 25 (0 UL)![]() ; Marso, Michel ![]() in Proc. 2nd International Conference on Advanced Semiconductor Devices and Microsystems (1998) Detailed reference viewed: 83 (0 UL)![]() ; Marso, Michel ![]() in Applied Physics Letters (1998), 72 Different conduction behavior is observed in nonstoichiometric ~NS! molecular-beam epitaxial GaAs grown at 200 °C below and above the critical thickness. In the low-field Ohmic region only the ... [more ▼] Different conduction behavior is observed in nonstoichiometric ~NS! molecular-beam epitaxial GaAs grown at 200 °C below and above the critical thickness. In the low-field Ohmic region only the monocrystalline part of the layer contributes to the room-temperature resistivity, but at higher temperatures the resistivity scales with the total layer thickness. In NS GaAs grown above the critical thickness, a superlinear J –V^n (n=2 – 3) dependence is found at intermediate fields. The prebreakdown voltage is proportional to the total thickness. This indicates that different defects control the electrical properties of the polycrystalline and monocrystalline parts of the NS GaAs. These results can be useful in the design of NS GaAs based devices, which operate at higher temperature and/or higher electric fields. [less ▲] Detailed reference viewed: 97 (0 UL)![]() Marso, Michel ![]() in Proceedings of the 6th International Workshop on High Performance Electron Devices for Microwave and Optoelectronic Applications (EDMO) (1998) Detailed reference viewed: 25 (0 UL)![]() ; Marso, Michel ![]() in Proceedings of the 28th European Solid State Devices Research Conference, Bordeaux, France, (1998) Detailed reference viewed: 36 (0 UL)![]() ; Jostock, Markus ![]() in High Performance Electron Devices for Microwave and Optoelectronic Applications (1997, November 24) Comparisons have been made between the channel currents in GaAs hESFETs prepared on GaAs buffer layers prepared at normal and low temperatures. All devices made on LT buffer layers had saturated channel ... [more ▼] Comparisons have been made between the channel currents in GaAs hESFETs prepared on GaAs buffer layers prepared at normal and low temperatures. All devices made on LT buffer layers had saturated channel currents which were about 20% of similar devices on a normal buffer. An attempt was made to remove Ga vacanciies from the LT buffer by a high temperature anneal step before the epitaxial layer was prepared. This had no effect in increasing the channel current. In all cases the pinchoiy voltage was unchanged indicating constancy of the channel thickness and donor concentration. It is concluded that the loss of current is due to a loss of mobile charge through trapping. [less ▲] Detailed reference viewed: 86 (1 UL)![]() Marso, Michel ![]() in Proceedings of 3rd Asia-Pacific Conference on Communications, Sydney, Australia (1997) Detailed reference viewed: 28 (1 UL)![]() ; ; et al in IEEE Electron Device Letters (1997), 18 We report on the dc and RF performance of HEMT’s based on the Al-free material system InP/InGaAs/InP. These structures were grown by LP-MOCVD using a nitrogen carrier. The influence of gate length and ... [more ▼] We report on the dc and RF performance of HEMT’s based on the Al-free material system InP/InGaAs/InP. These structures were grown by LP-MOCVD using a nitrogen carrier. The influence of gate length and channel composition on the performance of these devices is investigated.We demonstrate that optimum dc and RF performance using highly strained channels can be obtained only if additional composite channels are grown. The cutoff frequencies fT =160 GHz and fmax=260 GHz for a 0.1- um T-gate device indicate the suitability of our devices for W-Band applications. [less ▲] Detailed reference viewed: 1398 (45 UL)![]() Marso, Michel ![]() in Proceedings of the 9th International Conference on InP and Related Materials (1997) Detailed reference viewed: 78 (0 UL)![]() ; Marso, Michel ![]() Book published by Gordon and Brerach Science Publishers (1997) Detailed reference viewed: 53 (0 UL)![]() Marso, Michel ![]() in Solid-State Electronics (1997), 41(1997), 25-31 Detailed reference viewed: 42 (0 UL)![]() ; Marso, Michel ![]() in Applied Physics Letters (1997), 71 Current transport in low-temperature (LT) molecular-beam epitaxial GaAs grown at 200-300 °C on an n+ GaAs substrate is studied by means of current–voltage–temperature characteristics. The resistivity of ... [more ▼] Current transport in low-temperature (LT) molecular-beam epitaxial GaAs grown at 200-300 °C on an n+ GaAs substrate is studied by means of current–voltage–temperature characteristics. The resistivity of LT GaAs at low electric fields is rho>108 Ohm cm, much higher than resulting from van der Pauw measurements. It is found that the measured resistivity decreases with increasing the LT GaAs thickness. This is explained by space-charge effect in the vicinity of n+/LT GaAs junction and subsequent suppression of hopping conduction in the high-field junction region. [less ▲] Detailed reference viewed: 111 (0 UL)![]() ; Marso, Michel ![]() in Proceedings of the 9th International Conference on InP and Related Materials, Hyannis, Massachusetts, USA (1997) Detailed reference viewed: 79 (0 UL)![]() ; ; Marso, Michel ![]() in Electronics Letters (1996), 32 Detailed reference viewed: 165 (0 UL) |
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