References of "Arl, Didier"
     in
Bookmark and Share    
Full Text
Peer Reviewed
See detailElucidating the growth mechanism of ZnO films by atomic layer deposition with oxygen gas via isotopic tracking
Nguyen, Tai; Valle, Nathalie; Guillot, Jerome et al

in JOURNAL OF MATERIALS CHEMISTRY C (2021), 9(12), 4307-4315

The growth process of zinc oxide (ZnO) thin films by atomic layer deposition (ALD) accompanied by the presence of oxygen gas pulsing is investigated by means of the isotopic tracking of oxygen O-18 from ... [more ▼]

The growth process of zinc oxide (ZnO) thin films by atomic layer deposition (ALD) accompanied by the presence of oxygen gas pulsing is investigated by means of the isotopic tracking of oxygen O-18 from the water precursor and oxygen O-16 from the gas. In a previous study [T. Nguyen et al., Results Mater., 2020, 6, 100088, DOI: 10.1016/j.rinma.2020.100088], by means of structural, electrical, and optical characterizations, we identified key growth parameters of this unusual ALD process. Unexpectedly, the influence of molecular oxygen on the crystallography, microstructure, and morphology of the hundred-nanometer- to micrometer-thick ZnO films was significant. In this study, we present an unprecedented methodology by combining isotopic tracers with mass spectrometry to elucidate the role of the two different sources of oxygen atoms during the evolution of the growth. Notably, the use of in situ quartz crystal microbalance (QCM) and Secondary Ion Mass Spectrometry (SIMS) reveals new insights into the reaction mechanism for ZnO thin film growth. On the one hand, the non-negative mass change during the ZnO growth without O-2 gas is attributed to the presence of bare zinc atoms on the surface due to the reaction between monoethyl zinc and hydroxyl groups of the water precursor after the diethyl zinc pulse. On the other hand, the detection of ZnxOyC2H5- ions by Time-of-Flight SIMS (TOF-SIMS) and the mass increase during the O-2 pulse suggest a new reaction mechanism for the ZnO thin film growth in the presence of gaseous O-2 where the ethyl ligand of the zinc precursor can react with O-2 to form ethylperoxy radicals. The formations of the ethylperoxy zinc and/or zinc atoms lead to more adsorption of water to form ethylhydroperoxide during the water pulse, inducing the positive mass change. The use of an isotopic substitution allowed us to unambiguously associate the mass gain with the gradual incorporation of gaseous oxygen throughout the growth process and thereby support the chemical reaction. [less ▲]

Detailed reference viewed: 40 (0 UL)
Full Text
Peer Reviewed
See detailControlling electrical and optical properties of zinc oxide thin films grown by thermal atomic layer deposition with oxygen gas
Nguyen, Tai; Adjeroud, Noureddine; Guennou, Mael UL et al

in Results in Materials (2020), 6

The preparation of ZnO thin films with controlled electrical resistivity and optical properties is often challenged by the presence of defects, such as oxygen vacancies or interstitial zinc. Here, we ... [more ▼]

The preparation of ZnO thin films with controlled electrical resistivity and optical properties is often challenged by the presence of defects, such as oxygen vacancies or interstitial zinc. Here, we investigate the material properties of ZnO polycrystalline thin films prepared by thermal Atomic Layer Deposition (ALD) with the presence of molecular oxygen pulsing during the growth. By means of structural, electrical and optical characterizations, we identify key growth parameters of this unusual ALD process. Unexpectedly, the influence of oxygen molecules on the crystallography, microstructure and morphology of ZnO films is significant from hundred-nanometers to micrometer thick film. The electrical resistivity of the films grown with oxygen gas shows a dramatic increase from 3 to 4 orders of magnitude. Additionally, photoluminescence measurements reveal that deep-level emissions caused by defects located deep in the band gap can be reduced by applying an adequate pulsing of oxygen gas during the process. Finally, we conclude with a discussion about the degree of consistency between the chemical composition, the inner strain and the optical and electrical properties of the films obtained with the different thermodynamic parameters of growth. Several hypotheses are discussed in order to understand the dominance of (002) orientation in the presence of oxygen during the ALD growth process. [less ▲]

Detailed reference viewed: 49 (4 UL)