Reference : 4-Amino-1,2,4-triazole: Playing a key role in the chemical deposition of Cu–In–Ga met...
Scientific journals : Article
Physical, chemical, mathematical & earth Sciences : Physics
http://hdl.handle.net/10993/19130
4-Amino-1,2,4-triazole: Playing a key role in the chemical deposition of Cu–In–Ga metal layers for photovoltaic applications.
English
Berner, Ulrich [Robert Bosch GmbH, Germany]
Widenmeyer, Markus [Robert Bosch GmbH, Germany]
Engler, Patrick [Robert Bosch GmbH, Germany]
Dale, Phillip mailto [University of Luxembourg > Faculty of Science, Technology and Communication (FSTC) > Physics and Materials Science Research Unit >]
2014
Thin Solid Films
Yes
International
http://hdl.handle.net/10993/19130
10.1016/2014.10.057

File(s) associated to this reference

Fulltext file(s):

FileCommentaryVersionSizeAccess
Limited access
2014_4-Amino-1 2 4-Triazole Playing a key role in the chemical deposition of Cu-In-Ga metal layers for photovoltaic applications_berner-widenmeyer-engler-dale.pdfPublisher postprint914.48 kBRequest a copy

Bookmark and Share SFX Query

All documents in ORBilu are protected by a user license.