Reference : III-nitride nano-LEDs for single photon lithography
Scientific congresses, symposiums and conference proceedings : Paper published in a book
Engineering, computing & technology : Electrical & electronics engineering
http://hdl.handle.net/10993/18752
III-nitride nano-LEDs for single photon lithography
English
Trellenkamp, Stefan [Peter Grünberg Institute (PGI-9), Forschungszentrum Jülich, D-52425 Jülich, Germany and Jülich-Aachen Research Alliance, JARA, Fundamentals of Future Information Technology, Germany]
Mikulics, Martin [Peter Grünberg Institute (PGI-9), Forschungszentrum Jülich, D-52425 Jülich, Germany and Jülich-Aachen Research Alliance, JARA, Fundamentals of Future Information Technology, Germany]
Winden, Andreas [Peter Grünberg Institute (PGI-9), Forschungszentrum Jülich, D-52425 Jülich, Germany and Jülich-Aachen Research Alliance, JARA, Fundamentals of Future Information Technology, Germany]
Arango, Y. C. []
Moers, Jürgen [Peter Grünberg Institute (PGI-9), Forschungszentrum Jülich, D-52425 Jülich, Germany and Jülich-Aachen Research Alliance, JARA, Fundamentals of Future Information Technology, Germany]
Marso, Michel mailto [University of Luxembourg > Faculty of Science, Technology and Communication (FSTC) > Engineering Research Unit >]
Grützmacher, Detlev []
Hardtdegen, Hilde []
Oct-2014
Conference Proceedings The 10th International Conference on Advanced Semiconductor devices and Microsystems
85-88
No
No
International
978-1-4799-5474-2
10th Intern. Conf. Advanced Semicon. Dev. & Microsystems ASDAM 2014
from 20-10-2014 to 22-10-2014
Slovak University of Technology in Bratislava
Smolenice
Slovakia
[en] We fabricated and tested III-nitride (p-GaN/MQW/n-GaN/sapphire) based
nano-LEDs designed for operation in the single photon lithography
technique. The band edge luminescence energy of the III-nitride nano-LEDs
depends linearly on the structure size. Our studies provide clear evidence that
our technological process for the vertically integrated nano-LED emitters is
perfectly suited for long term operation without any indication of degradation
effects. This novel technology shows strong potential for a future flexible
single photon lithography [1] which is applicable for molecular photonic and
electronic circuits.
http://hdl.handle.net/10993/18752

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